Temperature and electron density measurements in a helium/hydrogen capacitively coupled microwave plasma

Spectrochimica Acta Part B: Atomic Spectroscopy

Volumn 47, Issue 4, 1992, Pages 481-491

  Masamba, W R L ^a   Ali, A H ^a   Winefordner, J D ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM; HYDROGEN; PLASMAS - TEMPERATURE MEASUREMENT; SPECTROMETERS - APPLICATIONS;

CAPACITIVELY COUPLED MICROWAVE PLASMA; ELECTRON DENSITY;

PLASMAS;

EID: 0026852732     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/0584-8547(92)80041-E     Document Type: Article

References (35)

1. Comparison of temperature measurements in ICP and MIP with Ar and He as plasma gas
2. A New Reduced-Pressure ICP Torch
3. Electrode heating sample vaporization in capacitively coupled microwave plasma atomic emission spectrometry
4. F i Oscillator Strengths Determined from Anomalous Dispersion of Shock-Heated Gases.
5. Arc Measurements of fe i Oscillator Strengths
6. Precision measurement of relative oscillator strengths - VIII. Measures of Fe I transitions from levels a3F2-4 (1.49-1.61 eV) with an accuracy of 1 per cent
7. Wavelengths and Transition Probabilities for Atoms and Atomic Ions Part II, Transition Probabilities
8. Physical and Analytical Aspects of a Microwave Excited Plasma