New Kinetic Model for Resist Dissolution

Journal of the Electrochemical Society

Volumn 139, Issue 4, 1992, Pages L35-L37

  Mack, Chris A ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MATHEMATICAL MODELS;

DISSOLUTION CHEMISTRY; DISSOLUTION INHIBITION; KINETIC MODEL; PHOTOACTIVE COMPOUND; RESIST DISSOLUTION;

PHOTORESISTS;

EID: 0026841803     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2069382     Document Type: Article

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5. C. A. Mack, Optical Microlith. IV, Proc., SPIE Vol. 538, pp. 207–220 (1985).
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8. P. Trefonas and B. K. Daniels, Advances in Resist Technology and Processing IV, Proc., SPIE Vol. 771, pp. 194–210 (1987).
9. Y. Hirai et al., IEEE Trans. Computer Aided Design, CAD-6, 403 (1987).
10. S. G. Hansen et al. Optical/Laser Microlith. IV, Proc., SPIE Vol. 1463, pp. 230–244 (1991).