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Plasma Chemistry and Plasma Processing
Volumn 12, Issue 1, 1992, Pages 35-53
Process study of thermal plasma chemical vapor deposition of diamond, part I: Substrate material, temperature, and methane concentration
Author keywords

chemical vapor deposition; Diamond films; experimental; thermal plasma synthesis
Indexed keywords

DIAMONDS - SYNTHETIC; FILMS - ADHESION; FILMS - SYNTHESIS; METALS AND ALLOYS - SUBSTRATES; METHANE - CONCENTRATION;
EID: 0026839614     PISSN: 02724324     EISSN: 15728986     Source Type: Journal    
DOI: 10.1007/BF01447943     Document Type: Article
Times cited : (58)
References (33)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.