Dependence of Thin-Oxide Films Quality on Surface Microroughness

IEEE Transactions on Electron Devices

Volumn 39, Issue 3, 1992, Pages 537-545

  Itano, Mitsushi ^c   Kawanabe, Ichiroh ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b Hashimoto Chemical Co Ltd ^*  (Japan)

^c DAIKIN INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN; OXIDES--THIN FILMS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICES;

DIELECTRIC BREAKDOWN; RCA CLEANING; SURFACE MICROROUGHNESS;

SEMICONDUCTING FILMS;

EID: 0026837569     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.123475     Document Type: Article

References (18)

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