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Volumn 13, Issue 3, 1992, Pages 146-148

A GaAs Memory Device Utilizing a Buried JFET Channel for Nondestructive Charge Sensing

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS--APPLICATIONS; SEMICONDUCTING GALLIUM ARSENIDE--APPLICATIONS; TRANSISTORS, FIELD EFFECT--APPLICATIONS;

EID: 0026835070     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/55.144992     Document Type: Article
Times cited : (6)

References (12)
  • 1
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    • (1987) IEEE Electron Device Lett. , vol.8 , Issue.5 , pp. 243
    • Dungan, T.E.1    Cooper, J.A.2    Melloch, M.R.3
  • 2
    • 0025461263 scopus 로고
    • One-transistor GaAs MESFET- and JFET-accessed dynamic RAM cells for high-speed medium density applications
    • July
    • T. E. Dungan, P. G. Neudeck, M. R. Melloch, and J. A. Cooper, Jr., “One-transistor GaAs MESFET- and JFET-accessed dynamic RAM cells for high-speed medium density applications,” IEEE Trans. Electron Devices, vol. 37, no. 7, p. 1599, July 1990.
    • (1990) IEEE Trans. Electron Devices , vol.37 , Issue.7 , pp. 1599
    • Dungan, T.E.1    Neudeck, P.G.2    Melloch, M.R.3    Cooper, J.A.4
  • 3
    • 0024768497 scopus 로고
    • Electrical characterization of a JFET-accessed GaAs dynamic RAM cell
    • Nov.
    • P. G. Neudeck, T. E. Dungan, J. A. Cooper, and M. R. Melloch, “Electrical characterization of a JFET-accessed GaAs dynamic RAM cell,” IEEE Electron Device Lett., vol. 10, pp. 477, Nov. 1989.
    • (1989) IEEE Electron Device Lett. , vol.10 , pp. 477
    • Neudeck, P.G.1    Dungan, T.E.2    Cooper, J.A.3    Melloch, M.R.4
  • 4
    • 84941869833 scopus 로고
    • Lmemories for gallium arsenide
    • Purdue Univ. West Lafayette, IN Aug.
    • T. E. Dungan, Dynamic memories for gallium arsenide, ” Ph.D. dissertation, Purdue Univ., West Lafayette, IN, Aug. 1989.
    • (1989) Ph.D. dissertation
    • Dungan, T.E.1
  • 5
    • 0024057259 scopus 로고
    • New floating-gate AlGaAs/GaAs memory devices with graded-gap electron injector and long retention times
    • Aug.
    • F. Capasso, F. Beltram, R. J. Malik, and J. F. Walker, “New floating-gate AlGaAs/GaAs memory devices with graded-gap electron injector and long retention times,” IEEE Electron Device Lett., vol. 9, no. 8, p. 377, Aug. 1988.
    • (1988) IEEE Electron Device Lett. , vol.9 , Issue.8 , pp. 377
    • Capasso, F.1    Beltram, F.2    Malik, R.J.3    Walker, J.F.4
  • 6
    • 0039848539 scopus 로고
    • Memory phenomena in heterojunction structures: Evidence for suppressed thermionic emission
    • Aug.
    • F. Beltram, F. Capasso, J. F. Walker, and R. J. Malik, “Memory phenomena in heterojunction structures: Evidence for suppressed thermionic emission,” Appl. Phys. Lett., vol. 53, no. 5, p. 376, Aug. 1988.
    • (1988) Appl. Phys. Lett. , vol.53 , Issue.5 , pp. 376
    • Beltram, F.1    Capasso, F.2    Walker, J.F.3    Malik, R.J.4
  • 7
    • 0024610772 scopus 로고
    • Electron emission from direct bandgap heterojunction capacitors
    • Feb.
    • J. S. Kleine, Q.-D. Qian, J. A. Cooper, Jr., and M. R. Melloch, “Electron emission from direct bandgap heterojunction capacitors,” IEEE Trans. Electron Devices, vol. 36, no. 2, p. 289, Feb. 1989.
    • (1989) IEEE Trans. Electron Devices , vol.36 , Issue.2 , pp. 289
    • Kleine, J.S.1    Qian, Q.-D.2    Cooper, J.A.3    Melloch, M.R.4
  • 8
    • 36549097047 scopus 로고
    • Anisotropic thermionic emission of electrons contained in GaAs/AlAs floating gate device structures
    • Sept.
    • J. A. Lott, J. F. Klem, and H. T. Weaver, “Anisotropic thermionic emission of electrons contained in GaAs/AlAs floating gate device structures,” Appl. Phys. Lett., vol. 55, no. 12, p. 1226, Sept. 1989.
    • (1989) Appl. Phys. Lett. , vol.55 , Issue.12 , pp. 1226
    • Lott, J.A.1    Klem, J.F.2    Weaver, H.T.3
  • 9
    • 0025448783 scopus 로고
    • Extremely low-leakage GaAs p-i-n junctions and memory capacitors grown by atomic layer epitaxy
    • June
    • S. M. Bedair et. al., “Extremely low-leakage GaAs p-i-n junctions and memory capacitors grown by atomic layer epitaxy,” IEEE Electron Device Lett., vol. 11, no. 6, p. 261, June 1990.
    • (1990) IEEE Electron Device Lett. , vol.11 , Issue.6 , pp. 261
    • Bedair, S.M.1
  • 10
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    • Carrier concentration and carrier lifetime measurements in semiconductor epitaxial layers by the MOS capacitance method
    • C. Jund and R. Poireir, “Carrier concentration and carrier lifetime measurements in semiconductor epitaxial layers by the MOS capacitance method,” Solid-State Electron., vol. 9, 315, 1966.
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    • Jund, C.1    Poireir, R.2
  • 11
    • 0015143168 scopus 로고
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    • Oct.
    • J. M. Mar, “A two-terminal memory cell using breakdown,” IEEE J. Solid-State Circuits, vol. SC-6, no. 5, p. 280, Oct. 1971.
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    • Mar, J.M.1
  • 12
    • 0017468922 scopus 로고
    • Electron traps in bulk and epitaxial GaAs crystals
    • Feb.
    • G. M. Martin, A. Mitonneau, and A. Mircea, “Electron traps in bulk and epitaxial GaAs crystals,” Electron. Lett., vol. 13, pp. 191, Feb. 1977.
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    • Martin, G.M.1    Mitonneau, A.2    Mircea, A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.