Partial agglomeration during Co silicide film formation

Journal of Materials Research

Volumn 7, Issue 2, 1992, Pages 269-272

  Osburn, C M ^b   Rozgonyi, G A ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b MCNC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION - MATHEMATICAL MODELS; COBALT AND ALLOYS - THIN FILMS; CRYSTALS - GRAIN BOUNDARIES;

COBALT SILICIDE; GRAIN BOUNDARY GROOVING; KIRKENDALL VOIDS; PARTIAL AGGLOMERATION;

SEMICONDUCTING SILICON;

EID: 0026818634     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/JMR.1992.0269     Document Type: Article

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