Point contact pseudo-metal/oxide/semiconductor transistor in as-grown silicon on insulator wafers

Materials Science and Engineering B

Volumn 12, Issue 1-2, 1992, Pages 191-194

  Williams, Stephen ^a   Cristoloveanu, Sorin ^a   Campisi, George ^b  

^a ENSERG   (France)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS - EFFECTS; OXYGEN - ION IMPLANTATION; SEMICONDUCTOR DEVICE MANUFACTURE - SILICON ON INSULATOR TECHNOLOGY; SEMICONDUCTOR DEVICES, MOS; TRANSISTORS, FIELD EFFECT;

MAJORITY CARRIERS; MINORITY CARRIERS;

SEMICONDUCTING SILICON;

EID: 0026759937     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-5107(92)90284-G     Document Type: Article

References (5)