Effect of rapid thermal plus conventional annealing on the microstructure of oxygen implanted SOI material

1991 IEEE International SOI Conference Proceedings

Volumn , Issue , 1992, Pages 114-115

  Krause, S J ^a   Chen, B L ^a   El Ghor, M K ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

HEAT TREATMENT--ANNEALING; MICROSTRUCTURE; SEMICONDUCTOR DEVICES;

DEFECT DENSITY; HEATING RATE EFFECTS; RAPID THERMAL ANNEALING; SEPARATION BY IMPLANTED OXYGEN; SIMOX;

SEMICONDUCTOR MATERIALS;

EID: 0026727525     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)