Recognition of D defects in silicon single crystals by preferential etching and effect on gate oxide integrity

Semiconductor Science and Technology

Volumn 7, Issue 1 A, 1992, Pages

  Yamagishi, H ^a   Fusegawa, I ^a   Fujimaki, N ^a   Katayama, M ^a  

^a SHIN ETSU CHEMICAL CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

D DEFECTS; SELECTIVE ETCHING; SINGLE CRYSTALS;

CRYSTALS--DEFECTS; ETCHING; OXIDES;

SEMICONDUCTING SILICON;

EID: 0026630810     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/7/1A/025     Document Type: Article

References (0)