Nature and degree of substitution patterns in novolaks by carbon-13 NMR spectroscopy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1672, Issue , 1992, Pages 347-359

  Khadim, Mohammad A ^a   Rahman, Mohammad D ^a   Durham, Dana L ^a  

^a Hoechst Celanese Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NUCLEAR MAGNETIC RESONANCE; PHENOLIC RESINS - MICROSTRUCTURE; PHOTORESISTS;

NMR SPECTROSCOPY; NOVOLAC BASED RESISTS; NOVOLAC RESINS; POSITIVE RESISTS;

POLYMERS;

EID: 0026488761     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.59779     Document Type: Conference Paper

References (13)