Formation of a well-ordered aluminium oxide overlayer by oxidation of NiAl(110)

Surface Science

Volumn 259, Issue 3, 1991, Pages 235-252

  Jaeger, R M ^a   Kuhlenbeck, H ^a   Freund, H J ^a   Wuttig, M ^b   Hoffmann, W ^b   Franchy, R ^b   Ibach, H ^b  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE--ANALYSIS; FILMS--ORDER-DISORDER; FILMS--SPECTROSCOPIC ANALYSIS; OXIDES--THIN FILMS; SPECTROSCOPY, PHOTOELECTRON--APPLICATIONS;

ALUMINUM OXIDE THIN FILMS; ELECTRON ENERGY LOSS SPECTROSCOPY; LOW ENERGY ELECTRON DIFFRACTION; NICKEL ALUMINIDE SURFACE OXIDATION; TWO-DIMENSIONAL BAND STRUCTURE; WELL-ORDERED OXIDE SURFACES;

NICKEL ALUMINUM ALLOYS;

EID: 0026414571     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(91)90555-7     Document Type: Article

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