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Volumn 38, Issue 12, 1991, Pages 2662-2668

Analytical Device Model for Submicrometer MOSFET'S

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES;

EID: 0026399115     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.158688     Document Type: Article
Times cited : (33)

References (22)
  • 1
    • 0022184756 scopus 로고
    • Observation of electron velocity overshoot in sub-100-nm-channel MOSFET'S in silicon
    • S. Y. Chou, D. A. Antoniadis, and H. I. Smith. “Observation of electron velocity overshoot in sub-100-nm-channel MOSFET'S in silicon,” IEEE Electron Device Lett., vol. EDL-6, pp. 665–667, 1985.
    • (1985) IEEE Electron Device Lett. , vol.EDL-6 , pp. 665-667
    • Chou, S.Y.1    Antoniadis, D.A.2    Smith, H.I.3
  • 2
    • 0024073264 scopus 로고
    • High transconductance and velocity overshoot in NMOS devices at the 0.1-µm gate-length level
    • G. A. Sai-Halasz, M. R. Wordeman, D. P. Kern, S. Rishton, and E. Ganin “High transconductance and velocity overshoot in NMOS devices at the 0.1-µm gate-length level,” IEEE Electron Device Lett., vol. 9, pp. 464–466, 1988.
    • (1988) IEEE Electron Device Lett. , vol.9 , pp. 464-466
    • Sai-Halasz, G.A.1    Wordeman, M.R.2    Kern, D.P.3    Rishton, S.4    Ganin, E.5
  • 3
    • 35949009958 scopus 로고
    • Monte Carlo analysis of electron transport in small semiconductor devices including band-structure and space-charge effects
    • M. V. Fischetti and S. E. Laux. “Monte Carlo analysis of electron transport in small semiconductor devices including band-structure and space-charge effects,” Phys. Rev. B, vol. 38, pp. 9721–9745, 1988.
    • (1988) Phys. Rev. B , vol.38 , pp. 9721-9745
    • Fischetti, M.V.1    Laux, S.E.2
  • 4
    • 0022114039 scopus 로고
    • A new set of semiconductor equations for computer simulation of submicron devices
    • C. T. Wang “A new set of semiconductor equations for computer simulation of submicron devices,” Solid-State Electron., vol. 28, pp. 783–788, 1985.
    • (1985) Solid-State Electron. , vol.28 , pp. 783-788
    • Wang, C.T.1
  • 5
    • 0003326917 scopus 로고
    • On the flow equation in device simulation
    • P. J. Price “On the flow equation in device simulation,” J. Appl. Pins., vol. 63, pp. 4718–4722, 1988.
    • (1988) J. Appl. Pins. , vol.63 , pp. 4718-4722
    • Price, P.J.1
  • 6
    • 0021501347 scopus 로고
    • The effect of high fields on MOS device and circuit performance
    • C. G. Sodini, P. K. Ko, and J. L. Moll. “The effect of high fields on MOS device and circuit performance,” IEEE Trans. Electron Devices, vol. ED-31, pp. 1386–1393, 1984.
    • (1984) IEEE Trans. Electron Devices , vol.ED-31 , pp. 1386-1393
    • Sodini, C.G.1    Ko, P.K.2    Moll, J.L.3
  • 7
    • 0018457254 scopus 로고
    • Model and performance of hot-electron MOS transistors for VLSI
    • B. Hoefflinger, H. Sibbert, and G. Zimmer, “Model and performance of hot-electron MOS transistors for VLSI,” IEEE Trans. Electron Devices, vol. Eb-26, pp. 513–520, 1979.
    • (1979) IEEE Trans. Electron Devices , vol.Eb-26 , pp. 513-520
    • Hoefflinger, B.1    Sibbert, H.2    Zimmer, G.3
  • 8
    • 0017466066 scopus 로고
    • A simple two-dimensional model for IGFET operation in the saturation region
    • Y. A. El-Mansy and A. R. Boothroyd “A simple two-dimensional model for IGFET operation in the saturation region,” IEEE Trans. Electron Devices, vol. ED-24, pp. 254–262, 1977.
    • (1977) IEEE Trans. Electron Devices , vol.ED-24 , pp. 254-262
    • El-Mansy, Y.A.1    Boothroyd, A.R.2
  • 9
    • 0038226726 scopus 로고
    • N. G. Einspruch and G. Sh. Gildenblat, Eds. San Diego, CA: Academic
    • P. K. Ko, Advanced MOS Device Physics, N. G. Einspruch and G. Sh. Gildenblat, Eds. San Diego, CA: Academic, 1988.
    • (1988) Advanced MOS Device Physics
    • Ko, P.K.1
  • 10
    • 0022044296 scopus 로고
    • An investigation of steady-state state velocity overshoot in silicon
    • G. Baccarani and M. R. Wordeman “An investigation of steady-state state velocity overshoot in silicon,” Solid-State Electron., vol. 28, pp. 407–416, 1985.
    • (1985) Solid-State Electron. , vol.28 , pp. 407-416
    • Baccarani, G.1    Wordeman, M.R.2
  • 11
    • 0019048875 scopus 로고
    • Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces
    • S. C. Sun and J. D. Plummer, “Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces,” IEEE Trans. Electron Devices, vol. ED-27, pp. 1497–1508, 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , pp. 1497-1508
    • Sun, S.C.1    Plummer, J.D.2
  • 12
    • 0024178927 scopus 로고
    • On the universality of inversion layer mobility in n- and p-channel MOSFET
    • S. Takagi, M. Iwase, and A. Toriumi. “On the universality of inversion layer mobility in n- and p-channel MOSFET,” in IEDM Tech. Dig., 1988, pp. 950-401.
    • (1988) IEDM Tech. Dig. , pp. 950-401
    • Takagi, S.1    Iwase, M.2    Toriumi, A.3
  • 13
    • 0024055902 scopus 로고
    • An engineering model for short-channel MOS devices
    • K. Y. Toh, P. K. Ko, and R. G. Meyer, “An engineering model for short-channel MOS devices,” IEEE J. Solid-State Circuits, vol. 23, pp. 950–958, 1988.
    • (1988) IEEE J. Solid-State Circuits , vol.23 , pp. 950-958
    • Toh, K.Y.1    Ko, P.K.2    Meyer, R.G.3
  • 14
    • 0014749359 scopus 로고
    • Hot electron effects and saturation velocities in silicon inversion layers
    • F. F. Fang and A. B. Fowler “Hot electron effects and saturation velocities in silicon inversion layers,” J. Appl. Phys., vol. 41, pp. 1825–1831, 1970.
    • (1970) J. Appl. Phys. , vol.41 , pp. 1825-1831
    • Fang, F.F.1    Fowler, A.B.2
  • 16
    • 0018960654 scopus 로고
    • Velocity of surface carriers in inversion layers on silicon
    • R. W. Coen and R. S. Muller, “Velocity of surface carriers in inversion layers on silicon,” Solid-State Electron., vol. 23, pp. 35–40, 1980.
    • (1980) Solid-State Electron. , vol.23 , pp. 35-40
    • Coen, R.W.1    Muller, R.S.2
  • 17
    • 0019016615 scopus 로고
    • Velocity saturation in short channel field effect transistors
    • W. Müller and I. Eisele. “Velocity saturation in short channel field effect transistors,” Solid-State Commun., vol. 34, pp. 447–449, 1980.
    • (1980) Solid-State Commun. , vol.34 , pp. 447-449
    • Müller, W.1    Eisele, I.2
  • 18
    • 0020717155 scopus 로고
    • High-field drift velocity of electrons at the Si-SiO2 interface as determined by a time-of-flight technique
    • J. A. Cooper, Jr. and D. F. Nelson “High-field drift velocity of electrons at the Si-SiO2 interface as determined by a time-of-flight technique,” J. Appl. Phys., vol. 54, pp. 1445–1456, 1983.
    • (1983) J. Appl. Phys. , vol.54 , pp. 1445-1456
    • Cooper, J.A.1    Nelson, D.F.2
  • 19
    • 0023831987 scopus 로고
    • High-field drift velocity of electrons in silicon inversion layers
    • A. Modelli and S. Manzini “High-field drift velocity of electrons in silicon inversion layers,” Solid-State Electron., vol. 31, pp. 99–104, 1988.
    • (1988) Solid-State Electron. , vol.31 , pp. 99-104
    • Modelli, A.1    Manzini, S.2
  • 22
    • 0018683243 scopus 로고
    • Characterization of the electron mobility in the inverted 〈100〉 Si surface
    • A. C. Sabnis and J. T. Clemens, “Characterization of the electron mobility in the inverted 〈100〉 Si surface,” in IEDM Tech. Dig., 1979, pp. 18–21.
    • (1979) IEDM Tech. Dig. , pp. 18-21
    • Sabnis, A.C.1    Clemens, J.T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.