Deep dry etching techniques as a new IC compatible tool for silicon micromachining

Transducers '91

Volumn , Issue , 1991, Pages 524-527

  Linder, C ^a   Tschan, T ^a   de Rooij, N F ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; METAL CUTTING - MICROMACHINING;

CHLORINE/FLUORINE GAS MIXTURES; DEEP DRY ETCHING; FLUORINE/OXYGEN GAS MIXTURES; PLASMA ETCHING; REACTIVE ION ETCHING; SILICON MICROMACHINING;

SILICON AND ALLOYS;

EID: 0026384280     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)