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Volumn , Issue , 1991, Pages 520-523
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An RIE process for submicron, silicon electromechanical structures
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
ACTUATORS;
ELECTROMECHANICAL DEVICES - MICROELECTROMECHANICAL;
SILICA;
SUBSTRATES;
PECVD DIOXIDE;
REACTIVE ION ETCHING;
SILICON ELECTROMECHANICAL STRUCTURES;
SINGLE-CRYSTAL SILICON;
THERMAL DIOXIDE;
SILICON AND ALLOYS;
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EID: 0026370922
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (13)
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References (10)
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