Surface Processing with Partially Ionized Plasmas

IEEE Transactions on Plasma Science

Volumn 19, Issue 6, 1991, Pages 1048-1062

  Coburn, J W ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS--OXIDATION; FILMS--PROCESSING; GLOW DISCHARGES; PLASMAS--IONIZATION;

PARTIALLY IONIZAED PLASMAS;

SURFACES;

EID: 0026370910     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/27.125030     Document Type: Article

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