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Volumn , Issue , 1991, Pages 957-960
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Control of residual stress of polysilicon thin films by heavy doping in surface micromachining
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
HEAT TREATMENT - ANNEALING;
SEMICONDUCTING SILICON - DOPING;
SENSORS - SILICON SENSORS;
STRAIN - MEASUREMENTS;
STRESSES - CONTROL;
POLYSILICON THIN FILMS;
RESIDUAL STRESS CONTROL;
SURFACE MICROMACHINING;
SEMICONDUCTING FILMS;
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EID: 0026370560
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
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Times cited : (49)
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References (10)
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