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Volumn 19, Issue 6, 1991, Pages 1063-1077

Nonequilibrium Volume Plasma Chemical Processing

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; ELECTRIC DISCHARGES; FLUE GASES--TREATMENT;

EID: 0026369362     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/27.125031     Document Type: Article
Times cited : (740)

References (39)
  • 1
    • 0003870460 scopus 로고
    • Berlin, Germany: Akademie-Verlag
    • H. Drost, Plasmachemie. Berlin, Germany: Akademie-Verlag, 1978.
    • (1978) Plasmachemie
    • Drost, H.1
  • 7
    • 0003959763 scopus 로고
    • (Philips Technical Library). London, UK: Macmillan
    • W. Elenbaas, Light Sources (Philips Technical Library). London, UK: Macmillan, 1972, p. 130.
    • (1972) Light Sources , pp. 130
    • Elenbaas, W.1
  • 9
    • 0020909452 scopus 로고
    • Corona discharge physics and applications
    • E. E. Kunhardt and L. H. Luessen, Eds. New York: Plenum
    • R. S. Sigmond and M. Goldman, “Corona discharge physics and applications” in Electrical Breakdown and Discharges in Gases, Part B, E. E. Kunhardt and L. H. Luessen, Eds. New York: Plenum, 1983, 1–64.
    • (1983) Electrical Breakdown and Discharges in Gases, Part B , pp. 1-64
    • Sigmond, R.S.1    Goldman, M.2
  • 10
    • 0001352873 scopus 로고
    • Corona discharges
    • M. N. Hirsh and H. J. Oskam, Eds. New York: Academic
    • M. Goldman and A. Goldman, “Corona discharges,” in Gaseous Electronics, Vol. I. M. N. Hirsh and H. J. Oskam, Eds. New York: Academic, 1978, 219–290.
    • (1978) Gaseous Electronics , vol.1 , pp. 219-290
    • Goldman, M.1    Goldman, A.2
  • 11
    • 0023456110 scopus 로고
    • Ozone synthesis from oxygen in dielectric barrier discharges
    • Nov
    • B. Eliasson, M. Hirth, and U. Kogelschatz, “Ozone synthesis from oxygen in dielectric barrier discharges,” J. Phys. D: Appl. Phys., vol. 20, no. 11, pp. 1421–1437, Nov. 1987.
    • (1987) J. Phys. D: Appl. Phys. , vol.20 , Issue.11 , pp. 1421-1437
    • Eliasson, B.1    Hirth, M.2    Kogelschatz, U.3
  • 13
    • 0342890186 scopus 로고
    • Trends in plasma sources and etching
    • Mar
    • D. L. Flamm, “Trends in plasma sources and etching,” Solid State Technol., vol. 34, no. 3, pp. 47–50, Mar. 1991.
    • (1991) Solid State Technol. , vol.34 , Issue.3 , pp. 47-50
    • Flamm, D.L.1
  • 14
    • 0026138161 scopus 로고
    • Etching issues at 0.35 μm and below
    • Apr
    • J. M. Cook and K. G. Donohoe, “Etching issues at 0.35 μm and below,” Solid State Technol, vol. 34, no. 3, pp. 119–124, Apr. 1991.
    • (1991) Solid State Technol , vol.34 , Issue.3 , pp. 119-124
    • Cook, J.M.1    Donohoe, K.G.2
  • 15
    • 0022678643 scopus 로고
    • Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing
    • Mar
    • M. Chaker, M. Moisan, and Z. Zakrzewski, “Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing,” Plasma Chem. Plasma Process., vol. 6., no. 1, pp. 79–96, Mar. 1986.
    • (1986) Plasma Chem. Plasma Process. , vol.6 , Issue.1 , pp. 79-96
    • Chaker, M.1    Moisan, M.2    Zakrzewski, Z.3
  • 16
    • 84927254609 scopus 로고
    • Development of electron avalanches and streamers
    • D. E. Lozanskii, “Development of electron avalanches and streamers,” Sov. Phys.-Usp., vol. 18, pp. 893–908, 1976.
    • (1976) Sov. Phys.-Usp. , vol.18 , pp. 893-908
    • Lozanskii, D.E.1
  • 17
    • 0007669927 scopus 로고
    • Development of overvoltage breakdown at high gas pressure
    • E. E. Kunhardt and W. W. Byszewski, “Development of overvoltage breakdown at high gas pressure,” Phys. Rev., vol. A21, no. 6, pp. 2069–2077, 1980.
    • (1980) Phys. Rev. , vol.A21 , Issue.6 , pp. 2069-2077
    • Kunhardt, E.E.1    Byszewski, W.W.2
  • 18
    • 0000660281 scopus 로고
    • N2O formation in ozonizers
    • B. Eliasson and U. Kogelschatz, “N 2 O formation in ozonizers,” J. Chimie Phys., vol. 83, no. 4, pp. 279–282, 1986.
    • (1986) J. Chimie Phys. , vol.83 , Issue.4 , pp. 279-282
    • Eliasson, B.1    Kogelschatz, U.2
  • 20
    • 0003048827 scopus 로고
    • Advanced ozone generation
    • S. Stucki, Ed. New York and London: Plenum
    • U. Kogelschatz, “Advanced ozone generation,” in Process Technologies for Water Treatment, S. Stucki, Ed. New York and London: Plenum, 1988, 87–120.
    • (1988) Process Technologies for Water Treatment , pp. 87-120
    • Kogelschatz, U.1
  • 21
    • 0023966466 scopus 로고
    • An investigation of the ozone-ammonia method of simultaneous desulphurization and denitrification of flue gases when burning Donetsk coals
    • Mar
    • V. Yu. Simachev et al, “An investigation of the ozone-ammonia method of simultaneous desulphurization and denitrification of flue gases when burning Donetsk coals,” Therm. Eng., vol. 35, no. 3, pp. 171–175, Mar. 1988.
    • (1988) Therm. Eng. , vol.35 , Issue.3 , pp. 171-175
    • Simachev, V.Y.1
  • 22
    • 67650288426 scopus 로고
    • Application of electrochemical ozone generators in ultrapure water systems
    • S. Stucki, Ed. New York and London: Plenum
    • S. Stucki and H. Baumann, “Application of electrochemical ozone generators in ultrapure water systems,” in Process Technologies for Water Treatment, S. Stucki, Ed. New York and London: Plenum, 1988, pp. 191–203.
    • (1988) Process Technologies for Water Treatment , pp. 191-203
    • Stucki, S.1    Baumann, H.2
  • 24
    • 84941441730 scopus 로고
    • Physics on plasma chemistry
    • July
    • P. Fauchais and J. Rakowitz, “Physics on plasma chemistry,” J. Phys., vol. 40, no. 7, C7-289-C7-312, July 1979.
    • (1979) J. Phys. , vol.40 , Issue.7 , pp. C7-289-C7-312
    • Fauchais, P.1    Rakowitz, J.2
  • 26
    • 0020719945 scopus 로고
    • Applications of nonequilibrium plasmas in organic chemistry
    • Mar
    • H. Suhr, “Applications of nonequilibrium plasmas in organic chemistry,” Plasma Chem. Plasma Process., vol. 3, no. 1, pp. 1–61, Mar. 1983.
    • (1983) Plasma Chem. Plasma Process. , vol.3 , Issue.1 , pp. 1-61
    • Suhr, H.1
  • 27
    • 0011748747 scopus 로고
    • Applications and trends in nonequilibrium plasma chemistry with organic and organometallic compounds
    • Mar
    • H. Suhr, “Applications and trends in nonequilibrium plasma chemistry with organic and organometallic compounds,” Plasma Chem. Plasma Process., vol. 9, no. 1, pp. 7S-28S, Mar. 1989 (suppl.).
    • (1989) Plasma Chem. Plasma Process. , vol.9 , Issue.1 , pp. 7S-28S
    • Suhr, H.1
  • 28
    • 0024065813 scopus 로고
    • UV excimer radiation from dielectric barrier discharges
    • Aug
    • B. Eliasson and U. Kogelschatz, “UV excimer radiation from dielectric barrier discharges,” Appl. Phys. B, vol. B46, no. 4, pp. 299–303, Aug. 1988.
    • (1988) Appl. Phys. B , vol.B46 , Issue.4 , pp. 299-303
    • Eliasson, B.1    Kogelschatz, U.2
  • 29
    • 0026141972 scopus 로고
    • Modeling and applications of silent discharge plasmas
    • Apr
    • B. Eliasson and U. Kogelschatz, “Modeling and applications of silent discharge plasmas,” IEEE Trans. Plasma Sci., vol. 19, pp. 309–322, Apr. 1991.
    • (1991) IEEE Trans. Plasma Sci. , vol.19 , pp. 309-322
    • Eliasson, B.1    Kogelschatz, U.2
  • 30
    • 0025843301 scopus 로고
    • Generation of excimer emission in dielectric barrier discharges
    • Jan
    • B. Gellert and U. Kogelschatz, “Generation of excimer emission in dielectric barrier discharges,” Appl. Phys. B, vol. B52, no. 1, pp. 14–21, Jan. 1991.
    • (1991) Appl. Phys. B , vol.B52 , Issue.1 , pp. 14-21
    • Gellert, B.1    Kogelschatz, U.2
  • 31
    • 84952620615 scopus 로고
    • Silent discharges for the generation of ultraviolet and vacuum ultraviolet radiation
    • Sept
    • U. Kogelschatz, “Silent discharges for the generation of ultraviolet and vacuum ultraviolet radiation,” Pure Appl. Chem., vol. 62, no. 9, pp. 1667–1674, Sept. 1990.
    • (1990) Pure Appl. Chem. , vol.62 , Issue.9 , pp. 1667-1674
    • Kogelschatz, U.1
  • 33
    • 0000944792 scopus 로고
    • Pulse corona-induced plasma chemical process: a horizon of new plasma chemical technologies
    • May
    • S. Masuda, “Pulse corona-induced plasma chemical process: a horizon of new plasma chemical technologies,” Pure Appl. Chem., vol. 60, no. 5, pp. 727–731, May 1988.
    • (1988) Pure Appl. Chem. , vol.60 , Issue.5 , pp. 727-731
    • Masuda, S.1
  • 34
    • 84941484361 scopus 로고
    • Impulse corona simulation for flue gas treatment
    • May
    • I. Gallimberti, “Impulse corona simulation for flue gas treatment,” Pure Appl. Chem., vol. 60, no. 5, pp. 663–374, May 1988.
    • (1988) Pure Appl. Chem. , vol.60 , Issue.5 , pp. 374-663
    • Gallimberti, I.1
  • 35
    • 84915937061 scopus 로고
    • Recent development in flue gas treatment by electron irradiation
    • Sept
    • S. Jordan and H. R. Paur, “Recent development in flue gas treatment by electron irradiation,” Beta-Gamma, vol. 1, no. 1, pp. 19–23, Sept. 1988.
    • (1988) Beta-Gamma , vol.1 , Issue.1 , pp. 19-23
    • Jordan, S.1    Paur, H.R.2
  • 36
    • 0024479375 scopus 로고
    • Combined removal of SO2, NOx and fly ash from simulated flue gas using pulsed streamer corona
    • Jan./Feb
    • J. S. Clements, A. Mizuno, W. C. Finney, and R. H. Davis, “Combined removal of SO 2, NO x and fly ash from simulated flue gas using pulsed streamer corona,” IEEE Trans. Ind. Appl., vol. 25, pp. 62–69, Jan./Feb. 1989.
    • (1989) IEEE Trans. Ind. Appl. , vol.25 , pp. 62-69
    • Clements, J.S.1    Mizuno, A.2    Finney, W.C.3    Davis, R.H.4
  • 38
    • 84941442120 scopus 로고
    • Hydrocarbon decomposition and oxidation in a plasma discharge
    • (Tokyo, Japan) Aug
    • R. S. Sheinson and N. S. Smyth, “Hydrocarbon decomposition and oxidation in a plasma discharge,” in Proc. 8th Int. Symp. on Plasma Chem. (ISPC-8) (Tokyo, Japan), Aug. 1987, pp. 648–653.
    • (1987) Proc. 8th Int. Symp. on Plasma Chem. (ISPC-8) , pp. 648-653
    • Sheinson, R.S.1    Smyth, N.S.2
  • 39
    • 33749574488 scopus 로고
    • Preparation of inorganic materials, surface treatment and etching in new low pressure plasmas: present status and future trends
    • Mar
    • S. Veprek, “Preparation of inorganic materials, surface treatment and etching in new low pressure plasmas: present status and future trends,” Plasma Chem. Plasma Process., vol. 9, no. 1, pp. 29S-54S, Mar. 1989 (suppl.).
    • (1989) Plasma Chem. Plasma Process. , vol.9 , Issue.1 , pp. 29S-254S
    • Veprek, S.1


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