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Volumn 10, Issue 4, 1991, Pages 341-353
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Novel: A nonlinear viscoelastic model for thermal oxidation of silicon
a a a
a
IBM
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER PROGRAMMING;
COMPUTER SOFTWARE;
VISCOELASTICITY;
SOFTWARE PACKAGE NOVEL;
THERMAL OXIDATION;
SEMICONDUCTING SILICON;
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EID: 0026368089
PISSN: 03321649
EISSN: None
Source Type: Journal
DOI: 10.1108/eb051711 Document Type: Review |
Times cited : (23)
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References (18)
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