I-line lithography for highly reproducible fabrication of surface acoustic wave devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1463, Issue , 1991, Pages 515-520

  Berek, Stefan ^a   Knauer, Ulrich ^a   Zottl, Helmut ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; PHOTORESISTS;

I LINE LITHOGRAPHY; LIFT OFF TECHNIQUE; LINEWIDTH CONTROL; PATTERNING PROCESS; REPRODUCIBILITY; WAFER PROBER;

ACOUSTIC SURFACE WAVE DEVICES;

EID: 0026366641     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)