Silica-Based Oxide Systems: I. Experimental and Calculated Phase Equilibria in Silicon, Boron, Phosphorus, Germanium, and Arsenic Oxide Mixtures

Journal of the Electrochemical Society

Volumn 138, Issue 9, 1991, Pages 2830-2835

  Madar, R ^b   Bernard, C ^a  

^a Centre National de la Recherche Scientifique   (France)

^b LABORATOIRE DES MATÉRIAUX ET DU GÉNIE PHYSIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS, VLSI - MATERIALS; MATHEMATICAL TECHNIQUES - POLYNOMIALS; OXIDES - PHASE DIAGRAMS; SILICA - THERMODYNAMIC PROPERTIES; THERMODYNAMICS - MATHEMATICAL MODELS;

GIBBS FREE ENTHALPY; PLANARIZATION LAYERS;

GLASS;

EID: 0026220404     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2086066     Document Type: Article

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