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Volumn 34, Issue 8, 1991, Pages 911-916
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A model for electromigration and low-frequency noise in thin metal films
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Author keywords
[No Author keywords available]
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Indexed keywords
INTEGRATED CIRCUITS, VLSI;
ELETROMIGRATION;
METALLIC FILMS;
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EID: 0026206616
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/0038-1101(91)90239-U Document Type: Article |
Times cited : (27)
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References (30)
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