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Volumn 38, Issue 8, 1991, Pages 1973-1976

The Importance of Neutral Base Recombination in Compromising the Gain of Si/SiGe Heterojunction Bipolar Transistors

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON COMPOUNDS - DOPING;

EID: 0026202819     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.119045     Document Type: Article
Times cited : (29)

References (15)
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    • (1990) J. Solid State Circuits , vol.25 , Issue.5 , pp. 1268-1276
    • Shaft, Z.A.1    Ashburn, P.2    Parker, G.J.3
  • 2
    • 0023994622 scopus 로고
    • Silicon-germanium base heterojunction bipolar transistors by molecular beam epitaxy
    • G. L. Patton, S. S. Iyer, S. L. Delage, S. Tiwari, and J. M. C. Stork, “Silicon-germanium base heterojunction bipolar transistors by molecular beam epitaxy,” IEEE Electron Device Lett., vol. 9, no. 4, pp. 165–167, 1988.
    • (1988) IEEE Electron Device Lett. , vol.9 , Issue.4 , pp. 165-167
    • Patton, G.L.1    Iyer, S.S.2    Delage, S.L.3    Tiwari, S.4    Stork, J.M.C.5
  • 3
    • 0024611641 scopus 로고
    • Si/Si1-xGex heterojunction bipolar transistors produced by limited reaction processing
    • C. A. King, J. L. Hoyt, C. M. Gronet, J. F. Gibbons, M. P. Scott, and J. Turner, “Si/Si1-xGex heterojunction bipolar transistors produced by limited reaction processing,” IEEE Electron Device Lett., vol. 10, no. 2, pp. 52–54, 1989.
    • (1989) IEEE Electron Device Lett. , vol.10 , Issue.2 , pp. 52-54
    • King, C.A.1    Hoyt, J.L.2    Gronet, C.M.3    Gibbons, J.F.4    Scott, M.P.5    Turner, J.6
  • 4
    • 0024751582 scopus 로고
    • Band gap and transport properties of Si1― xGex by analysis of nearly ideal Si/Si1xGev/Si heterojunction bipolar transistors
    • C. A. King, J. L. Hoyt, and J. F. Gibbons, “Band gap and transport properties of Si1― xGex by analysis of nearly ideal Si/Si1 ―xGev/Si heterojunction bipolar transistors,” IEEE Trans. Electron Devices, vol. 36, no. 10, pp. 2093–2103, 1989.
    • (1989) IEEE Trans. Electron Devices , vol.36 , Issue.10 , pp. 2093-2103
    • King, C.A.1    Hoyt, J.L.2    Gibbons, J.F.3
  • 5
    • 0024920289 scopus 로고
    • Si/SiGe heterojunction bipolar transistors with current gains up to 5000
    • H.-U. Schreiber and B. G. Bosch, “Si/SiGe heterojunction bipolar transistors with current gains up to 5000,” in IEDM Tech. Dig., 1989, pp. 643–646.
    • (1989) IEDM Tech. Dig. , pp. 643-646
    • Schreiber, H.-U.1    Bosch, B.G.2
  • 7
    • 0024959437 scopus 로고
    • Si/SiGe heterojunction bipolar transistors with base doping highly exceeding emitter doping concentration
    • H. U. Schreiber, B. G. Bosch, E. Kasper, and H. Kibbel, “Si/SiGe heterojunction bipolar transistors with base doping highly exceeding emitter doping concentration,” Electron. Lett., vol. 25, no. 3, pp. 185–186, 1989.
    • (1989) Electron. Lett. , vol.25 , Issue.3 , pp. 185-186
    • Schreiber, H.U.1    Bosch, B.G.2    Kasper, E.3    Kibbel, H.4
  • 11
    • 0022957473 scopus 로고
    • Measurement of electron lifetime, electron mobility, and band gap narrowing in heavily doped p-type silicon
    • S. E. Swirhun, Y. H. Kwark, and S. M. Swanson, “Measurement of electron lifetime, electron mobility, and band gap narrowing in heavily doped p-type silicon,” in IEDM Tech. Dig., 1986, p. 24.
    • (1986) IEDM Tech. Dig. , pp. 24
    • Swirhun, S.E.1    Kwark, Y.H.2    Swanson, S.M.3
  • 12
    • 84941859483 scopus 로고    scopus 로고
    • Waterloo Engineering Software
    • BIPOLE User Manual. Waterloo Engineering Software.
    • BIPOLE User Manual
  • 13
    • 0022327360 scopus 로고
    • Simultaneous measurement of hole lifetime, hole mobility, and bandgap narrowing in heavily doped n-type silicon
    • J. del Alamo, S. Swirhun, and R. M. Swanson, “Simultaneous measurement of hole lifetime, hole mobility, and bandgap narrowing in heavily doped n-type silicon,” in IEDM Tech. Dig., 1985, p. 290.
    • (1985) IEDM Tech. Dig. , pp. 290
    • del, J.1    Alamo, S.2    Swirhun, S.3    Swanson, R.M.4
  • 15
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    • The effect of base-emitter spacers and strain-dependent densities of states in Si/Si1-xGex/Si heterojunction bipolar transistors
    • E. J. Prinz, P. M. Garone, P. V. Schwartz, X. Xiao, and J. C. Sturm, “The effect of base-emitter spacers and strain-dependent densities of states in Si/Si1-xGex/Si heterojunction bipolar transistors,” in IEDM Tech. Dig., 1989, pp. 639–642.
    • (1989) IEDM Tech. Dig. , pp. 639-642
    • Prinz, E.J.1    Garone, P.M.2    Schwartz, P.V.3    Xiao, X.4    Sturm, J.C.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.