Thermal stability of TiSi2 films on single crystal and polycrystalline silicon

Journal of Materials Research

Volumn 6, Issue 7, 1991, Pages 1502-1511

  Shenai, K ^a  

^a GE GLOBAL RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS--THERMAL PROPERTIES; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICES, MOS; SILICON COMPOUNDS--FILMS;

POLYCRYSTALLINE SILICON; SINGLE CRYSTAL SILICON; THERMAL STABILITY; TITANIUM SILICIDE;

TITANIUM COMPOUNDS;

EID: 0026191679     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/JMR.1991.1502     Document Type: Article

References (12)

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6. These simulations were performed using the rump program from Cornell University.
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