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Volumn 39, Issue 7, 1991, Pages 1247-1251

Measurement and Analysis of Gaas Mesfet Parasitic Capacitances

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING GALLIUM ARSENIDE--ION IMPLANTATION; TRANSISTORS, FIELD EFFECT;

EID: 0026190496     PISSN: 00189480     EISSN: 15579670     Source Type: Journal    
DOI: 10.1109/22.85397     Document Type: Article
Times cited : (34)

References (11)
  • 1
    • 0014782014 scopus 로고
    • Potential due to a charged metallic strip on a semiconductor surface
    • E. Wasserstrom and J. McKenna, “Potential due to a charged metallic strip on a semiconductor surface,” Bell Syst. Tech. J. vol. 49, pp. 853–877, 1970.
    • (1970) Bell Syst. Tech. J. , vol.49 , pp. 853-877
    • Wasserstrom, E.1    McKenna, J.2
  • 2
    • 0041183993 scopus 로고
    • Electrode parasitic capacitances in GaAs MESFET’s
    • A. K. Goel, “Electrode parasitic capacitances in GaAs MESFET’s,” Solid State Electron., vol. 31, no. 10, pp. 1471–1476, 1988.
    • (1988) Solid State Electron. , vol.31 , Issue.10 , pp. 1471-1476
    • Goel, A.K.1
  • 3
    • 0019018807 scopus 로고
    • Determination of the electrode capacitance matrix for GaAs FET’s
    • May
    • N. G. Alexopoulos, J. A. Maupin, and P. T. Greiling, “Determination of the electrode capacitance matrix for GaAs FET’s,” IEEE Trans. Microwave Theory Tech., vol. MTT-28, pp. 459–466, May 1980.
    • (1980) IEEE Trans. Microwave Theory Tech. , vol.MTT-28 , pp. 459-466
    • Alexopoulos, N.G.1    Maupin, J.A.2    Greiling, P.T.3
  • 5
    • 0025385630 scopus 로고
    • Modeling and design of GaAs MESFET control devices
    • Feb
    • H. Jain and R. J. Gutmann, “Modeling and design of GaAs MESFET control devices,” IEEE Trans Microwave Theory Tech., vol. 38, pp. 109–117, Feb. 1990.
    • (1990) IEEE Trans Microwave Theory Tech. , vol.38 , pp. 109-117
    • Jain, H.1    Gutmann, R.J.2
  • 7
    • 33644769709 scopus 로고
    • Achieving greater on-wafer S-parameter accuracy with the LRM calibration technique
    • in
    • A. Davidson, E. Strid, and K. Jones, “Achieving greater on-wafer S -parameter accuracy with the LRM calibration technique,” in Proc. 34th Automatic RF Tech. Group Conf., 1989, pp. 61–66.
    • (1989) Proc. 34th Automatic RF Tech. Group Conf. , pp. 61-66
    • Davidson, A.1    Strid, E.2    Jones, K.3
  • 8
    • 0024048518 scopus 로고
    • A new method for determining FET small-signal equivalent circuits
    • July
    • G. Dambrine, A. Cappy, F. Heliodore, and E. Playez, “A new method for determining FET small-signal equivalent circuits,” IEEE Trans. Microwave Theory Tech., Vol. 36, pp. 1151–1159, July 1988.
    • (1988) IEEE Trans. Microwave Theory Tech. , vol.36 , pp. 1151-1159
    • Dambrine, G.1    Cappy, A.2    Heliodore, F.3    Playez, E.4
  • 10
    • 0024646145 scopus 로고
    • A process and device model for GaAs MESFET technology: GATES
    • Apr
    • R. Anholt and T. W. Sigmon, “A process and device model for GaAs MESFET technology: GATES,” IEEE Trans. ComputerAided Design, vol. 8, pp. 350–359, Apr. 1989.
    • (1989) IEEE Trans. ComputerAided Design , vol.8 , pp. 350-359
    • Anholt, R.1    Sigmon, T.W.2
  • 11
    • 84941476214 scopus 로고    scopus 로고
    • Dependence of GaAs MESFET fringe capacitances on fabrication technologies
    • to be published
    • R. Anholt, “Dependence of GaAs MESFET fringe capacitances on fabrication technologies,” Solid State Electron., to be published.
    • Solid State Electron.
    • Anholt, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.