Insulation and passivation of three-dimensional substrates by plasma-CVD thin films using silicon-organic compounds

Materials Science and Engineering A

Volumn 139, Issue C, 1991, Pages 380-384

  Peters, D ^a   Muller J ^a   Sperling, T ^a  

^a HAMBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; FILMS; PLASMAS; POLYMERIZATION; SILICATES;

CATHODIC DEPOSITION; HEXAMETHYLDISILAZANE; PLASMA REACTOR; TETRAETHYLORTHOSILICATE;

COATING TECHNIQUES;

EID: 0026185963     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-5093(91)90646-5     Document Type: Article

References (5)