Measurement of Ultrathin (<100 A) Oxide Films by Multiple-Angle Incident Ellipsometry

Journal of the Electrochemical Society

Volumn 138, Issue 6, 1991, Pages 1756-1761

  Chao, Tien Sheng ^a   Lee, Chung Len ^a   Lei, Tan Fu ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS - THICKNESS MEASUREMENT; SILICA - THIN FILMS; SURFACE PHENOMENA - MATHEMATICAL MODELS;

ELLIPSOMETRY; ULTRATHIN OXIDE FILMS;

SEMICONDUCTING SILICON;

EID: 0026172458     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2085868     Document Type: Article

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