Thickness and Compositional Nonuniformities of Ultrathin Oxides Grown by Rapid Thermal Oxidation of Silicon in N20

Journal of the Electrochemical Society

Volumn 138, Issue 6, 1991, Pages L13-L16

  Chu, T Y ^a   Ting, W T ^a   Ahn, J ^a   Kwong, D L ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILMS - DIELECTRIC; NITROGEN OXIDES - REDUCTION; SILICA - THIN FILMS;

NITROUS OXIDE; SILICON WAFERS; ULTRATHIN OXIDES;

SEMICONDUCTING SILICON;

EID: 0026170943     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2085888     Document Type: Article

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