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Volumn 138, Issue 6, 1991, Pages 1752-1755

Fluorine-Enhanced Oxidation of Silicon Effects of Fluorine on Oxide Stress and Growth Kinetics

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS - REACTION KINETICS; FLUORINE - EFFECTS; SILICA - STRESSES;

EID: 0026168863     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2085867     Document Type: Article
Times cited : (39)

References (21)
  • 3
    • 84975370053 scopus 로고
    • Quick Reference Manual for Silicon Integrated Circuit Technology
    • Editors New York
    • W. E. Beadle, J. C. C. Tsai, and R. D. Plummer, Editors, “Quick Reference Manual for Silicon Integrated Circuit Technology,” pp. 1-20, John Wiley & Sons, New York (1985).
    • (1985) John Wiley & Sons , pp. 1-20
    • Beadle, W.E.1    Tsai, J.C.C.2    Plummer, R.D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.