Modeling Optical Equipment for Wafer Alignment and Line-Width Measurement

IEEE Transactions on Semiconductor Manufacturing

Volumn 4, Issue 2, 1991, Pages 99-110

  Yuan, Chi Min ^a   Strojwas, Andrzej J ^b  

^a East Fishkill ^*  (United States)

^b CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; IMAGING TECHNIQUES; LITHOGRAPHY - PHOTOLITHOGRAPHY; MICROSCOPES; SIGNAL PROCESSING;

DIFFERENTIAL INTERFERENCE CONTRAST MICROSCOPES; DIFFERENTIAL PHASE CONTRAST MICROSCOPE; LINEWIDTH MEASUREMENT; OPTICAL METROLOGY EQUIPMENT; SOFTWARE PACKAGE METRO; WAFER ALIGNMENT IMAGES;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0026156377     PISSN: 08946507     EISSN: 15582345     Source Type: Journal    
DOI: 10.1109/66.79722     Document Type: Article

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