A Low Damage, Low Contaminant Plasma Processing System Utilizing Energy Clean Technology

IEEE Transactions on Semiconductor Manufacturing

Volumn 4, Issue 2, 1991, Pages 111-121

  Goto, Haruhiro H ^a   Sasaki, Makoto ^a   Ohmi, Tadahiro ^b   Shibata, Tadashi ^b   Yamagami, Atsushi ^c   Okamura, Nobuyuki ^c   Kamiya, Osamu ^c  

^a Applied Materials Japan ^*  (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ENVIRONMENTAL IMPACT; EQUATIONS OF MOTION; MAGNETIC FIELD EFFECTS; PLASMAS; SPUTTERING;

CYCLOTRON RADIATION; EXCITATION FREQUENCY EFFECT; ION BOMBARDMENT ENERGY CONTROL; LANGMUIR PROBE; PLASMA PROCESSING SYSTEM; SECONDARY RF EXCITATION;

INTEGRATED CIRCUITS, ULSI;

EID: 0026154071     PISSN: 08946507     EISSN: 15582345     Source Type: Journal    
DOI: 10.1109/66.79723     Document Type: Article

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