Growth of ge microcrystals in si02 thin film matrices: A raman and electron microscopic study

Japanese Journal of Applied Physics

Volumn 30, Issue 4, 1991, Pages 687-694

  Fujii, Minoru ^b   Hayashi, Shinji ^a   Yamamoto, Keiichi ^a  

^a KOBE UNIVERSITY   (Japan)

^b Graduate School of Science and Technology   (Japan)

Author keywords

Electron microscopy; Germanium; Microcrystal; Phonon confinement; Raman spectroscopy; Rf sputter ing; Sio2; Thin film

Indexed keywords

CRYSTALS; MICROSCOPES, ELECTRON; SILICA - THIN FILMS; SPECTROSCOPY, RAMAN;

MICROCRYSTALS;

SEMICONDUCTING GERMANIUM;

EID: 0026142904     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.30.687     Document Type: Article

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