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Volumn 34, Issue 4, 1991, Pages 107-111
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In situ monitoring of etching uniformity in plasma reactors
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Author keywords
[No Author keywords available]
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Indexed keywords
ETCHING - MONITORING;
SPECTROSCOPIC ANALYSIS;
ETCHANT CONCENTRATION;
ETCHING UNIFORMITY;
OPTICAL EMISSION SPECTROSCOPY;
PLASMA REACTORS;
PLASMAS;
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EID: 0026138445
PISSN: 0038111X
EISSN: None
Source Type: Trade Journal
DOI: None Document Type: Article |
Times cited : (25)
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References (9)
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