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Volumn 12, Issue 4, 1991, Pages 154-156

Enhancement-Mode Quantum-Well Gex Si1―x PMOS

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; MOLECULAR BEAM EPITAXY; SEMICONDUCTING GERMANIUM COMPOUNDS;

EID: 0026138240     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/55.75748     Document Type: Article
Times cited : (175)

References (11)
  • 1
    • 84864384696 scopus 로고
    • 1-x/Si strained layer heterostructures
    • R. People, “Physics and applications of GexSi1–x/Si strained layer heterostructures,” IEEE J. Quantum Electron., vol. QE-22, p. 1696, 1986.
    • (1986) IEEE J. Quantum Electron. , vol.QE-22 , pp. 1696
    • People, R.1
  • 2
    • 0001530931 scopus 로고
    • 1-x/Si heterostructures on a GeSi buffer layer
    • S. S. Rhee, J. S. Park, R. P. G. Karunasiri, Q. Ye, and K. L. Wang, “Resonant tunnelling through a Si/GexSi1–x/Si heterostructures on a GeSi buffer layer,” Appl. Phys. Lett., vol. 53, p. 204, 1988.
    • (1988) Appl. Phys. Lett. , vol.53 , pp. 204
    • Rhee, S.S.1    Park, J.S.2    Karunasiri, R.P.G.3    Ye, Q.4    Wang, K.L.5
  • 4
    • 0024611641 scopus 로고
    • x heterojunction bipolar transistors produced by limited reaction processing
    • C. A. King et al., “Si/Si1–xGex heterojunction bipolar transistors produced by limited reaction processing,” IEEE Electron Device Lett., vol. 10, p. 52, 1989.
    • (1989) IEEE Electron Device Lett. , vol.10 , pp. 52
    • King, C.A.1
  • 5
    • 0025419030 scopus 로고
    • TSiGe-base heterojunction bipolar transistors
    • G. L. Patton et al., “75-GHz fTSiGe-base heterojunction bipolar transistors,” IEEE Electron Device Lett., vol. 11, p. 171, 1990.
    • (1990) IEEE Electron Device Lett. , vol.11 , pp. 171
    • Patton, G.L.1
  • 7
    • 0000973048 scopus 로고
    • Wet oxidation of GeSi strained layers by rapid thermal processing
    • D. K. Nayak, K. Kamjoo, J. S. Park, J. C. S. Woo, and K. L. Wang, “Wet oxidation of GeSi strained layers by rapid thermal processing,” Appl. Phys. Lett., vol. 57, p. 369, 1990.
    • (1990) Appl. Phys. Lett. , vol.57 , pp. 369
    • Nayak, D.K.1    Kamjoo, K.2    Park, J.S.3    Woo, J.C.S.4    Wang, K.L.5
  • 8
    • 0021483045 scopus 로고
    • Lucky-electron model of channel hot-electron injection in MOSFET’s
    • S. Tam, P. K. Ko, and C. Hu, “Lucky-electron model of channel hot-electron injection in MOSFET’s,” IEEE Trans. Electron. Devices, vol. ED-31, p. 1116, 1984.
    • (1984) IEEE Trans. Electron. Devices , vol.ED-31 , pp. 1116
    • Tam, S.1    Ko, P.K.2    Hu, C.3
  • 9
    • 0023362543 scopus 로고
    • Subhalf-micrometer p-channel MOSFET with 3.5-nm gate oxide fabricated using X-ray lithography
    • M. Miyake et al., “Subhalf-micrometer p-channel MOSFET with 3.5-nm gate oxide fabricated using X-ray lithography,” IEEE Electron Device Lett., vol. EDL-8, p. 266, 1987.
    • (1987) IEEE Electron Device Lett. , vol.EDL-8 , pp. 266
    • Miyake, M.1
  • 10
    • 48549114462 scopus 로고
    • Two-dimensional electronic system for high-speed device applications
    • T. P. Pearsall, “Two-dimensional electronic system for high-speed device applications,” Surface Sci., vol. 142, p. 529, 1984.
    • (1984) Surface Sci. , vol.142 , pp. 529
    • Pearsall, T.P.1
  • 11
    • 0022720216 scopus 로고
    • Enhancement- and depletion-mode p-channel modulation-doped FET’s
    • T. P. Pearsall and J. C. Bean, “Enhancement- and depletion-mode p-channel modulation-doped FET’s,” IEEE Electron Device Lett., vol. EDL-7, p. 308, 1986.
    • (1986) IEEE Electron Device Lett. , vol.EDL-7 , pp. 308
    • Pearsall, T.P.1    Bean, J.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.