Three-Dimensional Numerical Simulation of Local Oxidation of Silicon

IEEE Transactions on Electron Devices

Volumn 38, Issue 3, 1991, Pages 505-511

  Umimoto, Hiroyuki ^a   Odanaka, Shinji ^a  

^a PANASONIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION--APPLICATIONS; INTEGRATED CIRCUITS--MASKS; MICROSCOPIC EXAMINATION--SCANNING ELECTRON MICROSCOPY; OXIDES;

BEAM BENDING THEORY; LOCAL OXIDATION OF SILICON (LOCOS); MASK STRUCTURE EFFECT; NITRIDE MASK BENDING STRESS; THREE-DIMENSIONAL NUMERICAL SIMULATION;

SEMICONDUCTING SILICON;

EID: 0026121972     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.75159     Document Type: Article

References (16)

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