Fabrication of an All-Refractory Circuit Using Lift-Off with Image-Reversal Photoresist

IEEE Transactions on Magnetics

Volumn 27, Issue 2, 1991, Pages 3121-3124

  Meier, Daniel L ^a   Przybysz, John X ^a   Kang, Joonhee ^a  

^a WESTINGHOUSE ELECTRIC COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS; SUPERCONDUCTING DEVICES - JOSEPHSON JUNCTIONS;

ALL-REFRACTORY CIRCUITS; REACTIVE ION ETCHING;

COMPUTERS, DIGITAL;

EID: 0026120996     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/20.133872     Document Type: Article

References (10)

1. J. X. Przybysz, R. D. Blaugher, and J. Buttyan, “Processing Techniques for Refractory Integrated Circuits.” IEEE Trans. on Magnetics, Vol. 25, 1127, March 1989.
2. X. F. Meng, R. S. Amos, A. W. Lichtenberger, R. J. Mattauch. and M. J. Feldman, “NbN Edge Junction Fabrication: Edge Profile Control by Reactive Ion Etching,” IEEE Trans. on Magnetics, Vol. 25, 1239, March 1989.
3. D. L. Flamm, “Introduction to Plasma Chemistry,” Chap. 2 in Plasma Etching, An Introduction, D. M. Manos and D. L. Flamm, Eds., Academic Press, New York, 1989. pp. 155–159.
4. J. X. Przybysz, “Process Improvements for Fabrication of Josephson Shift Registers,” extended abstracts of the 1989 International Superconductivity Electronics Conference, pp. 267–270, Tokyo, June 1989.
5. H. Moritz, “Optical Single Layer Lift-Off Process,” IEEE Trans. on Electron Devices, Vol. ED-32, 672, March 1985.
6. V. Marriott, C. M. Garza, M. Spak, “Image Reversal: A Practical Approach to Submicron Lithography.” Proc. SPIE 771, 221, 1987.
7. A. W. Lichtenberger, C. P. McClay, R. J. Mattauch, and M. J. Feldman, “Fabrication of Nb/Al A1 2O3/Nb Junctions with Extremely Low Leakage Currents,” IEEE Trans. on Magnetics. Vol. 25, 1247, March 1989.
8. Hoechst Celanese Corporation, Electronic Products Division. 3070 Highway 22 West, Somerville, New Jersey 08876.
9. J. X. Przybysz, R. D. Blaugher, and J. Buttyan, “Josephson Shift Register Design and Layout,” IEEE Trans on Magnetics, Vol. 25, 837, March 1989.
10. J. X. Przybysz, D. L. Meier, and J. H. Kang, “Shift Register Performance at 4 GHz,” this issue.