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Volumn 13, Issue 1-4, 1991, Pages 65-68
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Profile abnormality in a chemical amplification resist system
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRON BEAM LITHOGRAPHY;
SENSITIVITY ANALYSIS;
ACIDS - APPLICATIONS;
LITHOGRAPHY - RESEARCH;
MATHEMATICAL STATISTICS - MONTE CARLO METHODS;
SUBSTRATES - APPLICATIONS;
CATALYST CONCENTRATION;
CHEMICAL AMPLIFICATION;
DIFFUSION COMPONENTS;
DIFFUSION EFFECTS;
DISSOLUTION RATES;
PATTERN PROFILE;
RESIST PROFILE;
RESIST SENSITIVITY;
CATALYSTS;
PHOTORESISTS;
BETHE'S ENERGY LOSS FORMULA;
ELECTRON SCATTERING SUBSIMULATORS;
PATTERN PROFILE ABNORMALITIES;
RUTHERFORD SCATTERING MODELS;
SAL691-ER7 CHEMICAL AMPLIFICATION RESIST SYSTEMS;
SPIN ON GLASS SUBSTRATES;
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EID: 0026118461
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/0167-9317(91)90049-J Document Type: Article |
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Times cited : (18)
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References (6)
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