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Volumn 27, Issue 2, 1991, Pages 3109-3112

Fabrication Process for a Josephson Computer ETL-JC1 Using Nb Tunnel Junctions

Author keywords

[No Author keywords available]

Indexed keywords

DATA STORAGE, DIGITAL - RANDOM ACCESS; INTEGRATED CIRCUITS, LSI;

EID: 0026116750     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/20.133870     Document Type: Article
Times cited : (15)

References (17)
  • 1
    • 36749108668 scopus 로고
    • High quality refractory Josephson tunnel junctions utilizing thin aluminum layers
    • Mar.
    • M.Gurvitch, M. A. Washington, and H. A. Huggins, “High quality refractory Josephson tunnel junctions utilizing thin aluminum layers,” Appl. Phys. Lett. vol. 42, no. 5, pp. 472–474, Mar. 1983.
    • (1983) Appl. Phys. Lett. , vol.42 , Issue.5 , pp. 472-474
    • Gurvitch, M.1    Washington, M.A.2    Huggins, H.A.3
  • 2
    • 0001084394 scopus 로고
    • Niobium nitride Josephson tunnel junctions with magnesium oxide barriers
    • June
    • A.Shoji, M.Aoyagi, S.Kosaka, F.Shinoki, and H.Hayakawa, “Niobium nitride Josephson tunnel junctions with magnesium oxide barriers,” Appl. Phys. Lett. vol. 46, no. 11, pp.1098-1100, June 1985.
    • (1985) Appl. Phys. Lett. , vol.46 , Issue.11 , pp. 1098-1100
    • Shoji, A.1    Aoyagi, M.2    Kosaka, S.3    Shinoki, F.4    Hayakawa, H.5
  • 3
    • 0000511869 scopus 로고
    • Selective niobium anodization process for fabricating Josephson tunnel junctions
    • H. Kroger, L. N. Smith, and D. W. Jillie, “Selective niobium anodization process for fabricating Josephson tunnel junctions,” Appl. Phys. Lett. vol. 39, pp. 280–282, 1981.
    • (1981) Appl. Phys. Lett. , vol.39 , pp. 280-282
    • Kroger, H.1    Smith, L.N.2    Jillie, D.W.3
  • 10
    • 0022442929 scopus 로고
    • Nb/Al-oxide/Nb tunnel junctions for Josephson integrated circuits
    • Jan.
    • H.Nakagawa, K.Nakaya, I.Kurosawa, S.Takada, and H.Hayakawa, “Nb/Al-oxide/Nb tunnel junctions for Josephson integrated circuits,” Jpn. J. Appl. Phys. vol. 25, no. 1, pp. L70-L72, Jan. 1986.
    • (1986) Jpn. J. Appl. Phys. , vol.25 , Issue.1 , pp. 170-172
    • Nakagawa, H.1    Nakaya, K.2    Kurosawa, I.3    Takada, S.4    Hayakawa, H.5
  • 11
    • 36549104956 scopus 로고
    • Niobium-stress influence on Nb/Al-oxide/Nb Josephson junctions
    • Apr.
    • K.Kuroda and M.Yuda, “Niobium-stress influence on Nb/Al-oxide/Nb Josephson junctions,” J. Appl. Phys. vol. 63, no. 7, pp. 2352–2357, Apr. 1988.
    • (1988) J. Appl. Phys. , vol.63 , Issue.7 , pp. 2352-2357
    • Kuroda, K.1    Yuda, M.2
  • 12
    • 0020592937 scopus 로고
    • Thin film fabrication for the Josephson technology cross-sectional model
    • Jan.-Mar.
    • A.A.Bright, J.H.Greiner, S.P.Klepner, R.H.Wang, and A.J.Warnecke, “Thin film fabrication for the Josephson technology cross-sectional model,” J. Vac, Sci. Technol. B1(1), pp. 77–90, Jan.-Mar. 1983.
    • (1983) J. Vac, Sci. Technol , vol.B 1 , Issue.1 , pp. 77-90
    • Bright, A.A.1    Greiner, J.H.2    Klepner, S.P.3    Wang, R.H.4    Warnecke, A.J.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.