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Journal of Analytical Atomic Spectrometry

Volumn 6, Issue 1, 1991, Pages 57-71

Comparison of microwave-induced plasma sources

(4) Forbes, Kimberely A a Reszke, Edward E a,b Uden, Peter C a Barnes, Ramon M a

a UNIVERSITY OF MASSACHUSETTS (United States)

b Plazmatronika Ltd ^* (Poland)

Author keywords

Microwave induced plasma; Operating conditions; Source design

Indexed keywords

CHEMICAL ANALYSIS; MICROWAVES; PLASMA APPLICATIONS; PLASMA SOURCES;

GAS FLOW RATES; MICROWAVE INDUCED SOURCES; SPECTRAL EMISSION PROPERTIES;

SPECTROMETRY;

EID: 0026109394 PISSN: 02679477 EISSN: None Source Type: Journal
DOI: 10.1039/ja9910600057 Document Type: Review

Times cited : (35)

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