Pressure Dependence of Plasma Parameters in Medium-Vacuum Nitrogen Arc Discharge with the Titanium Cathode

IEEE Transactions on Plasma Science

Volumn 19, Issue 1, 1991, Pages 25-28

  Sakaki, Mamoru ^a   Sakakibara, Tateki ^b  

^a KUSHIRO NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRIC ARCS; NITROGEN; PRESSURE EFFECTS; TITANIUM AND ALLOYS;

PHYSICAL VAPOR DEPOSITION;

PLASMAS;

EID: 0026106014     PISSN: 00933813     EISSN: 19399375     Source Type: Journal    
DOI: 10.1109/27.62363     Document Type: Article

References (9)

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3. P. J. Martin et al., “Characterization of a Ti vacuum arc and the structure of deposited Ti and TiN films,” J. Vac. Sci. Technol., Vol. A5, No. 1, pp. 22-28, Jan./Feb. 1987.
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9. M. Sakaki and T. Sakakibara, “Plasma property in medium vacuum arc discharge,” in Proc. Tech. Meet. Elec. Discharge (Japan), 1988, ED-88-41.