Reactively sputtered RuO2 thin film resistor with near zero temperature coefficient of resistance

Thin Solid Films

Volumn 196, Issue 1, 1991, Pages 29-34

  Jia, Q X ^a   Shi, Z Q ^a   Jiao, K L ^a   Anderson, W A ^a   Collins, F M ^b  

^a UNIVERSITY AT BUFFALO   (United States)

^b Ohmtek Inc ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

RUTHENIUM COMPOUNDS - THIN FILMS; SPUTTERING; X-RAY ANALYSIS;

TEMPERATURE COEFFICIENT OF RESISTANCE;

RESISTORS;

EID: 0026103176     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(91)90171-S     Document Type: Article

References (8)