Polyvinylphenols protected with tetrahydropyranyl group in chemical amplification positive deep UV resist systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1466, Issue , 1991, Pages 377-383

  Hayashi, Nobuaki ^a   Schlegel, Leo ^a   Takumi, Ueno ^a   Shiraishi, Hiroshi ^a   Iwayanagi, Takao ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS, VLSI; LASERS, EXCIMER; PHENOLS; ULTRAVIOLET RADIATION;

ACID GENERATORS; CHEMICAL AMPLIFICATION; DEEP UV RESISTS; NOVOLAK RESINS; POSITIVE RESISTS;

PHOTORESISTS;

EID: 0025844109     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)