Simulation of two-dimensional etch profile of silicon during orientation-dependent anisotropic etching

Proceedings. IEEE Micro Electro Mechanical Systems

Volumn , Issue , 1991, Pages 216-220

  Koide, Akira ^a   Sato, Kazuo ^a   Tanaka, Shinji ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMECHANICAL DEVICES--MICROELECTROMECHANICAL; SEMICONDUCTOR DEVICES; SOLUTIONS;

ANISOTROPIC ETCHING; SILICON WAFERS;

SEMICONDUCTING SILICON;

EID: 0025793011     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)