High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

Surface and Coatings Technology

Volumn 43-44, Issue PART 1, 1990, Pages 270-278

  Sproul, William D ^a   Rudnik, Paul J ^a   Graham, Michael E ^a   Rohde, Suzanne L ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS - THIN FILMS; CHEMICAL REACTIONS - MAGNETIC FIELD EFFECTS; SPUTTERING - CHEMICAL REACTIONS;

MAGNETRON SPUTTERING; REACTIVE SPUTTERING; TITANIUM NITRIDE;

COATINGS;

EID: 0025701313     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(90)90080-V     Document Type: Article

References (17)

1. Titanium aluminum nitride films: A new alternative to TiN coatings
2. American Institute of Physics Conference Proceedings 149
3. Charged particle fluxes from planar magnetron sputtering sources
4. Unbalanced dc magnetrons as sources of high ion fluxes
5. Unbalanced magnetron ion-assisted deposition and property modification of thin films
6. Proc American Vacuum Society 36th Annu Symp