CMOS/SOI hardening at 100 Mrad(SiO2)

IEEE Transactions on Nuclear Science

Volumn 37, Issue 6, 1990, Pages 2013-2019

  Leray, J L ^a   Dupont Nivet, E ^a   Pere J F ^a   Coic Y M ^a   Raffaelli, M ^a   Auberton Herve A J ^b   Bruel, M ^b   Giffard, B ^b   Margail, J ^b  

^a CEA DIF   (France)

^b CEA GRENOBLE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTERS, MICROCOMPUTER; GAMMA RAYS; SEMICONDUCTOR DEVICE MANUFACTURE--SILICON ON INSULATOR TECHNOLOGY; SEMICONDUCTOR DEVICES--RADIATION HARDENING;

SIMOX PROCESS;

INTEGRATED CIRCUITS, CMOS;

EID: 0025658655     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/23.101223     Document Type: Article

References (17)

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