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Volumn 1261, Issue , 1990, Pages 225-237
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In-situ develop end point control to eliminate CD variance
a
a
Xinix Inc
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(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
INTEGRATED CIRCUIT MANUFACTURE;
PHOTORESISTS;
PRECISION ENGINEERING;
CD (CRITICAL DIMENSIONS);
CD VARIANCE;
LITHOGRAPHY;
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EID: 0025589907
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (2)
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References (9)
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