A half-micron CMOS technology using ultra-thin silicon on insulator

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1990, Pages 583-586

  Woerlee, P H ^a   Juffermans, C ^a   Lifka, H ^a   Manders, W ^a   Lansink, F M Oude ^a   Paulzen, G M ^a   Sheridan, P ^a   Walker, A ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING FILMS; SEMICONDUCTING SILICON--THIN FILMS; SEMICONDUCTOR DEVICE MANUFACTURE--SILICON ON INSULATOR TECHNOLOGY; SEMICONDUCTOR DEVICES, MOS;

HALF-MICRON CMOS TECHNOLOGY; NMOS DEVICES; ULTRA-THIN SILICON;

INTEGRATED CIRCUITS, CMOS;

EID: 0025578859     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)