New topography expression model and 3D-topography simulation of Al-sputter deposition, etching, and photolithography

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1990, Pages 905-908

  Fujinaga, M ^a   Kunikiyo, T ^a   Uchida, T ^a   Kotani, N ^a   Osaki, A ^a   Akasaka, Y ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ETCHING; LITHOGRAPHY--PHOTOLITHOGRAPHY; SPUTTERING;

3D-TOPOGRAPHY SIMULATION;

ALUMINUM AND ALLOYS;

EID: 0025578854     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)