A polycrystalline-Si1-xGex-gate CMOS technology

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1990, Pages 253-256

  King, Tsu Jae ^a   Pfiester, James R ^a   Shott, John D ^a   McVittie, James P ^a   Saraswat, Krishna C ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS; INTEGRATED CIRCUITS, VLSI; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICES, MOS;

POLYCRYSTALLINE SILICON; POLYSILICON; SILICON-GERMANIUM-GATE CMOS;

INTEGRATED CIRCUITS, CMOS;

EID: 0025578484     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)