Characterization of lateral dopant diffusion in silicides

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 1990, Pages 245-248

  Chu, Charles L ^a   Saraswat, Krishna C ^a   Wong, S Simon ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON COMPOUNDS--DOPING;

DOPANT SOURCES; LATERAL DIFFUSION; SILICIDES;

SEMICONDUCTOR DEVICES, SCHOTTKY BARRIER;

EID: 0025577331     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)