Large area doping process for fabrication of p-Si TFT's using bucket ion source and XeCl excimer laser annealing

Conference on Solid State Devices and Materials

Volumn , Issue , 1990, Pages 971-974

  Kawachi, Genshiro ^a   Aoyama, Takashi ^a   Suzuki, Takaya ^a   Mimura, Akio ^a   Ohno, Yasunori ^a   Konishi, Nobutake ^a   Mochizuki, Yasuhiro ^a  

^a GTC ^*  (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS; HEAT TREATMENT - ANNEALING; ION SOURCES; LASERS, EXCIMER; SEMICONDUCTING SILICON - DOPING;

POLYSILICON; THIN FILM TRANSISTORS;

TRANSISTORS;

EID: 0025540279     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.7567/ssdm.1990.s-e-9     Document Type: Conference Paper

References (0)